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dc.contributor.authorHuang, HWen_US
dc.contributor.authorKuo, HCen_US
dc.contributor.authorChu, JTen_US
dc.contributor.authorLai, CFen_US
dc.contributor.authorKao, CCen_US
dc.contributor.authorLu, TCen_US
dc.contributor.authorWang, SCen_US
dc.contributor.authorTsai, RJen_US
dc.contributor.authorYu, CCen_US
dc.contributor.authorLin, CFen_US
dc.date.accessioned2014-12-08T15:16:20Z-
dc.date.available2014-12-08T15:16:20Z-
dc.date.issued2006-06-28en_US
dc.identifier.issn0957-4484en_US
dc.identifier.urihttp://dx.doi.org/10.1088/0957-4484/17/12/030en_US
dc.identifier.urihttp://hdl.handle.net/11536/12124-
dc.description.abstractThis investigation describes the development of a InGaN/GaN light-emitting diode (LED) with textured sidewalls using natural lithography with polystyrene spheres (PSs) as the etching mask and dry etching the epitaxial layers of LEDs to achieve nano-scale textured sidewalls. The LED with textured sidewalls increased the output power of the InGaN - GaN multiple quantum well (MQW) LEDs by a factor of 1.3, indicating that the LED with nano-scale textured sidewalls had larger light extraction efficiency. The wall-plug efficiency of nitride-based LEDs was increased by 30% using textured sidewalls.en_US
dc.language.isoen_USen_US
dc.titleNitride-based LEDs with nano-scale textured sidewalls using natural lithographyen_US
dc.typeArticleen_US
dc.identifier.doi10.1088/0957-4484/17/12/030en_US
dc.identifier.journalNANOTECHNOLOGYen_US
dc.citation.volume17en_US
dc.citation.issue12en_US
dc.citation.spage2998en_US
dc.citation.epage3001en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000238256300030-
dc.citation.woscount26-
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