Fabrication and characterization of poly-Si nanowire devices with performance enhancement techniques

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	Su, Chun-Jung	en_US
dc.contributor.author	Lin, Homg-Chih	en_US
dc.contributor.author	Tsai, Hsien-Hung	en_US
dc.contributor.author	Huang, Tiao-Yuan	en_US
dc.contributor.author	Ni, Wei-Xin	en_US
dc.date.accessioned	2014-12-08T15:16:46Z	-
dc.date.available	2014-12-08T15:16:46Z	-
dc.date.issued	2007	en_US
dc.identifier.isbn	978-1-4244-0584-8	en_US
dc.identifier.uri	http://hdl.handle.net/11536/12334	-
dc.language.iso	en_US	en_US
dc.title	Fabrication and characterization of poly-Si nanowire devices with performance enhancement techniques	en_US
dc.type	Proceedings Paper	en_US
dc.identifier.journal	2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA), Proceedings of Technical Papers	en_US
dc.citation.spage	120	en_US
dc.citation.epage	121	en_US
dc.contributor.department	電子工程學系及電子研究所	zh_TW
dc.contributor.department	Department of Electronics Engineering and Institute of Electronics	en_US
dc.identifier.wosnumber	WOS:000247059300053	-
顯示於類別：	會議論文