完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Chen, Yin-Nien | en_US |
dc.contributor.author | Fan, Ming-Long | en_US |
dc.contributor.author | Hu, Vita Pi-Ho | en_US |
dc.contributor.author | Su, Pin | en_US |
dc.contributor.author | Chuang, Ching-Te | en_US |
dc.date.accessioned | 2015-07-21T11:20:55Z | - |
dc.date.available | 2015-07-21T11:20:55Z | - |
dc.date.issued | 2014-12-01 | en_US |
dc.identifier.issn | 1549-8328 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1109/TCSI.2014.2335032 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/123868 | - |
dc.description.abstract | This paper investigates the feasibility of sub-0.2 V high-speed low-power circuits with hetero-channel MOSFET and emerging Tunneling FET (TFET) devices. First, the device designs and characteristics of hetero-channel MOSFET and TFET devices are discussed and compared. Due to the significant leakage current of ultra-low V-T hetero-channel MOSFET devices, assist-circuits are required for hetero-channel MOSFET-based circuits to operate at 0.2 V. Second, the delay, dynamic energy and the Standby power of hetero-channel TFET-based and MOSFET-based logic circuits including Inverter, NAND, BUS Driver, and Latch are analyzed and evaluated. The results indicate that hetero-channel TFET-based circuits with Dual Oxide (DOX) device design to reduce the Miller capacitance provide the potential to achieve high-speed low-power operation at V-DD = 0.2 V, while the use of assist-circuits in MOSFET-based design improves the delay and dynamic energy at the expense of increased device count, circuit area, and large Standby and sleep-mode leakage power. Finally, the impacts of temperature and process variations on TFET-based and MOSFET-based logic circuits are discussed. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | Hetero-channel MOSFET | en_US |
dc.subject | high-speed | en_US |
dc.subject | lowpower | en_US |
dc.subject | tunnel FET | en_US |
dc.title | Evaluation of Sub-0.2 V High-Speed Low-Power Circuits Using Hetero-Channel MOSFET and Tunneling FET Devices | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1109/TCSI.2014.2335032 | en_US |
dc.identifier.journal | IEEE TRANSACTIONS ON CIRCUITS AND SYSTEMS I-REGULAR PAPERS | en_US |
dc.citation.volume | 61 | en_US |
dc.citation.issue | 12 | en_US |
dc.citation.spage | 3339 | en_US |
dc.citation.epage | 3347 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000345581200003 | en_US |
dc.citation.woscount | 0 | en_US |
顯示於類別: | 期刊論文 |