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dc.contributor.authorIslamov, D. R.en_US
dc.contributor.authorGritsenko, V. A.en_US
dc.contributor.authorCheng, C. H.en_US
dc.contributor.authorChin, A.en_US
dc.date.accessioned2015-07-21T11:20:59Z-
dc.date.available2015-07-21T11:20:59Z-
dc.date.issued2014-12-29en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.4905308en_US
dc.identifier.urihttp://hdl.handle.net/11536/124065-
dc.description.abstractIn this study, we demonstrated experimentally that formation of chains and islands of oxygen vacancies in hafnium sub-oxides (HfOx, x < 2) leads to percolation charge transport in such dielectrics. Basing on the model of Efros-Shklovskii percolation theory, good quantitative agreement between the experimental and theoretical data of current-voltage characteristics was achieved. Based on the percolation theory suggested model shows that hafnium sub-oxides consist of mixtures of metallic Hf nanoscale clusters of 1-2 nm distributed onto non-stoichiometric HfOx. It was shown that reported approach might describe low resistance state current-voltage characteristics of resistive memory elements based on HfOx. (C) 2014 AIP Publishing LLC.en_US
dc.language.isoen_USen_US
dc.titlePercolation conductivity in hafnium sub-oxidesen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.4905308en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume105en_US
dc.citation.issue26en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.identifier.wosnumberWOS:000347171300032en_US
dc.citation.woscount0en_US
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