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dc.contributor.authorWen, Hua-Chiangen_US
dc.contributor.authorChou, Wu-Chingen_US
dc.contributor.authorYau, Wei-Hungen_US
dc.contributor.authorFan, Wen-Chungen_US
dc.contributor.authorLee, Lingen_US
dc.contributor.authorJian, Kun-Fengen_US
dc.date.accessioned2015-07-21T08:29:19Z-
dc.date.available2015-07-21T08:29:19Z-
dc.date.issued2015-03-15en_US
dc.identifier.issn0925-8388en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.jallcom.2014.10.162en_US
dc.identifier.urihttp://hdl.handle.net/11536/124183-
dc.description.abstractIn this study we examined the effects of the nanoindentation-induced residual stress of single-crystalline zinc selenide (ZnSe). We employed the nanoindentation technique to evaluate the dislocation mobility of ZnSe at loading ratios of 10 and 2 mN/min, with a holding time of 120 s under a constant load. We visualized the resultant dislocation and microcracks using cathodoluminescence (CL) spectroscopy and mapping to compare the nanoindentation-induced residual stresses of the various ZnSe samples. CL mapping revealed massive dislocation activities during the loading process. The dislocations played roles as nonradiative recombination centers that quenched the local CL intensity. Transmission electron microscopy also revealed the effects of nanoindentation-induced residual stress. To obtain insight into the influence of the residual stress and to determine the dislocation mobilities for ZnSe films, it was essential to monitor the quenching effect of nonradiative recombination centers as a function of CL mapping. (C) 2014 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectZnSeen_US
dc.subjectNanoindentationen_US
dc.subjectCathodoluminescenceen_US
dc.subjectTransmission electron microscopyen_US
dc.titleUsing nanoindentation and cathodoluminescence to investigate the residual stress of ZnSeen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.jallcom.2014.10.162en_US
dc.identifier.journalJOURNAL OF ALLOYS AND COMPOUNDSen_US
dc.citation.volume625en_US
dc.citation.spage52en_US
dc.citation.epage56en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000347408900007en_US
dc.citation.woscount1en_US
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