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dc.contributor.authorSong, Jieen_US
dc.contributor.authorChang, Shih-Pangen_US
dc.contributor.authorZhang, Chengen_US
dc.contributor.authorHsu, Ta-Chengen_US
dc.contributor.authorHan, Jungen_US
dc.date.accessioned2015-07-21T08:28:28Z-
dc.date.available2015-07-21T08:28:28Z-
dc.date.issued2015-01-14en_US
dc.identifier.issn1944-8244en_US
dc.identifier.urihttp://dx.doi.org/10.1021/am506162zen_US
dc.identifier.urihttp://hdl.handle.net/11536/124383-
dc.description.abstractWe have demonstrated nitrogen-polar (000 (1) over bar) (N-polar) InGaN multiple quantum wells (MQWs) with significantly improved luminescence properties prepared by pulsed metalorganic chemical vapor deposition. During the growth of InGaN quantum wells, Ga and N sources are alternately injected into the reactor to alter the surface stoichiometry. The influence of flow duration in pulsed growth mode on the luminescence properties has been studied. We find that use of pulsed-mode creates a high density of hexagonal mounds with an increased InGaN growth rate and enhanced In composition around screw-type dislocations, resulting in remarkably improved luminescence properties. The mechanism of enhanced luminescence caused by the hexagonal mounds is discussed. Luminescence properties of N-polar InGaN MQWs grown with short pulse durations have been significantly improved in comparison with a sample grown by a conventional continuous growth method.en_US
dc.language.isoen_USen_US
dc.subjectN-polaren_US
dc.subjectInGaN MQWsen_US
dc.subjectMOCVDen_US
dc.subjectphotoluminescenceen_US
dc.subjectmoundsen_US
dc.titleSignificantly Improved Luminescence Properties of Nitrogen-Polar (000(1over bar>)over-bar) InGaN Multiple Quantum Wells Grown by Pulsed Metalorganic Chemical Vapor Depositionen_US
dc.typeArticleen_US
dc.identifier.doi10.1021/am506162zen_US
dc.identifier.journalACS APPLIED MATERIALS & INTERFACESen_US
dc.citation.spage273en_US
dc.citation.epage278en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000348085200034en_US
dc.citation.woscount0en_US
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