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dc.contributor.authorLee, Lingen_US
dc.contributor.authorDai, Yue-Ruen_US
dc.contributor.authorYang, Chu-Shouen_US
dc.contributor.authorFan, Wen-Chungen_US
dc.contributor.authorChou, Wu-Chingen_US
dc.date.accessioned2015-07-21T08:29:22Z-
dc.date.available2015-07-21T08:29:22Z-
dc.date.issued2015-05-25en_US
dc.identifier.issn0925-8388en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.jallcom.2015.01.268en_US
dc.identifier.urihttp://hdl.handle.net/11536/124441-
dc.description.abstractThis study discovered the origin of deep level emission in zinc-blende ZnCdSe thin films grown by molecular beam epitaxy, in which a localization behavior was noticed. Pronounced deep level emission observed in films grown under a VI/II ratio of 1.74 (Se-accumulated regime) could be suppressed by a lower VI/II ratio of 1.04 (intermediate regime) and 0.74 (metal-rich regime). Hence the localized states could be correlated to excess selenium accumulated at the growth surface. The localized states also influence the carrier relaxation process of self-assembled ZnTe quantum dots embedded in a ZnCdSe matrix. Once quantum dots surmount the wetting layer, localized electrons in the capping layer dominate the type-II transition and exhibit size-independent lifetimes. (C) 2015 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectSemiconductorsen_US
dc.subjectNanostructured materialsen_US
dc.subjectVapor depositionen_US
dc.subjectOptical propertiesen_US
dc.subjectTime-resolved optical spectroscopiesen_US
dc.titleOrigin of localized states in zinc-blende ZnCdSe thin films and the influence on carrier relaxation of self-assembled ZnTe/ZnCdSe quantum dotsen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.jallcom.2015.01.268en_US
dc.identifier.journalJOURNAL OF ALLOYS AND COMPOUNDSen_US
dc.citation.volume632en_US
dc.citation.spage392en_US
dc.citation.epage396en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000350388900058en_US
dc.citation.woscount0en_US
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