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dc.contributor.authorPeng, YCen_US
dc.contributor.authorKao, CCen_US
dc.contributor.authorHuang, HWen_US
dc.contributor.authorChu, JTen_US
dc.contributor.authorLu, TCen_US
dc.contributor.authorKuo, HCen_US
dc.contributor.authorWang, SCen_US
dc.contributor.authorYu, CCen_US
dc.date.accessioned2014-12-08T15:17:02Z-
dc.date.available2014-12-08T15:17:02Z-
dc.date.issued2006-04-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.45.3446en_US
dc.identifier.urihttp://hdl.handle.net/11536/12461-
dc.description.abstractIn this paper, we report a GaN-based microcavity light-emitting diode (MCLED) which is composed of 25 pairs of high-reflectivity GaN/AlN distributed Bragg reflector (DBR) and 6 pairs of ex-situ deposited SiO2/TiO2 dielectric mirrors. The electroluminescence peak of this structure matched well with the high reflectance area of the top and bottom DBRs, and shows a narrow emission of approximately 6.7 nm. The fabricated device also shows a more excellent performance on the stability of the emission peak wavelength while varying injection current density and operating temperature than a regular LED.en_US
dc.language.isoen_USen_US
dc.subjectGaNen_US
dc.subjectmicrocavityen_US
dc.subjectMCLEDen_US
dc.subjectlight-emitting diodeen_US
dc.titleFabrication and characteristics of GaN-based microcavity light-emitting diodes with high reflectivity AIN/GaN distributed Bragg reflectorsen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1143/JJAP.45.3446en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERSen_US
dc.citation.volume45en_US
dc.citation.issue4Ben_US
dc.citation.spage3446en_US
dc.citation.epage3448en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000237570600113-
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