完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Wang, TC | en_US |
dc.contributor.author | Kuo, HC | en_US |
dc.contributor.author | Lu, TC | en_US |
dc.contributor.author | Tsai, CE | en_US |
dc.contributor.author | Tsai, MY | en_US |
dc.contributor.author | Hsu, JT | en_US |
dc.contributor.author | Yang, JR | en_US |
dc.date.accessioned | 2014-12-08T15:17:02Z | - |
dc.date.available | 2014-12-08T15:17:02Z | - |
dc.date.issued | 2006-04-01 | en_US |
dc.identifier.issn | 0021-4922 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1143/JJAP.45.3560 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/12462 | - |
dc.description.abstract | We reports a study of InGaN Multiple quantum dot layers. Using the in-situ SiNx treatment process, InGaN multiple quantum dot layers were successfully developed. The InGaN multiple quantum dot layers were constructed with SiNx dot mask layers, InGaN dot layers, and GaN cap layers on a 2-mu m-thick GaN underlying layer on a sapphire substrate. Optical properties including room temperature photoluminescence (PL), temperature dependent PL, and low power power-dependent PL were examined and discussed. The structure was also analyzed by transmission electron microscopy (TEM) and energy dispersive X-ray (EDX) line scan. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | InGaN QDs | en_US |
dc.subject | MOCVD | en_US |
dc.title | Study of InGaN multiple quantum dots by metal organic chemical vapor deposition | en_US |
dc.type | Article; Proceedings Paper | en_US |
dc.identifier.doi | 10.1143/JJAP.45.3560 | en_US |
dc.identifier.journal | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | en_US |
dc.citation.volume | 45 | en_US |
dc.citation.issue | 4B | en_US |
dc.citation.spage | 3560 | en_US |
dc.citation.epage | 3563 | en_US |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | Department of Photonics | en_US |
dc.identifier.wosnumber | WOS:000237570600139 | - |
顯示於類別: | 會議論文 |