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dc.contributor.authorWang, TCen_US
dc.contributor.authorKuo, HCen_US
dc.contributor.authorLu, TCen_US
dc.contributor.authorTsai, CEen_US
dc.contributor.authorTsai, MYen_US
dc.contributor.authorHsu, JTen_US
dc.contributor.authorYang, JRen_US
dc.date.accessioned2014-12-08T15:17:02Z-
dc.date.available2014-12-08T15:17:02Z-
dc.date.issued2006-04-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.45.3560en_US
dc.identifier.urihttp://hdl.handle.net/11536/12462-
dc.description.abstractWe reports a study of InGaN Multiple quantum dot layers. Using the in-situ SiNx treatment process, InGaN multiple quantum dot layers were successfully developed. The InGaN multiple quantum dot layers were constructed with SiNx dot mask layers, InGaN dot layers, and GaN cap layers on a 2-mu m-thick GaN underlying layer on a sapphire substrate. Optical properties including room temperature photoluminescence (PL), temperature dependent PL, and low power power-dependent PL were examined and discussed. The structure was also analyzed by transmission electron microscopy (TEM) and energy dispersive X-ray (EDX) line scan.en_US
dc.language.isoen_USen_US
dc.subjectInGaN QDsen_US
dc.subjectMOCVDen_US
dc.titleStudy of InGaN multiple quantum dots by metal organic chemical vapor depositionen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1143/JJAP.45.3560en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERSen_US
dc.citation.volume45en_US
dc.citation.issue4Ben_US
dc.citation.spage3560en_US
dc.citation.epage3563en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000237570600139-
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