標題: | Improvement of Resistive Switching Characteristic in Silicon Oxide-Based RRAM Through Hydride-Oxidation on Indium Tin Oxide Electrode by Supercritical CO2 Fluid |
作者: | Chang, Kuan-Chang Tsai, Tsung-Ming Chang, Ting-Chang Zhang, Rui Chen, Kai-Huang Chen, Jung-Hui Chen, Min-Chen Huang, Hui-Chun Zhang, Wei Lin, Chih-Yang Tseng, Yi-Ting Lin, Hua-Ching Zheng, Jin-Cheng Sze, Simon M. 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | RRAM;SCCO2;ITO;SiO2 |
公開日期: | 1-Jun-2015 |
摘要: | Supercritical carbon dioxide (SCCO2) fluid technology was applied to indium-tin-oxide (ITO) electrode to improve the resistive switching characteristic of silicon oxide RRAM through hydride oxidation for the first time. We found device power consumption can be effectively reduced so that side effects can be also restricted under device operation. By applying SCCO2 fluid, more oxygen ions will be introduced into the ITO electrode and thus the participation of net oxygen ions in the RRAM redox reaction will increase. Fourier transform spectroscopy and X-ray photoelectron spectroscopy were used to confirm hydride oxidation on ITO electrode. Combined with the current fitting results, we proposed a reaction model to explain the improvement of resistive switching in RRAM by SCCO2 fluids. |
URI: | http://dx.doi.org/10.1109/LED.2015.2426055 http://hdl.handle.net/11536/124787 |
ISSN: | 0741-3106 |
DOI: | 10.1109/LED.2015.2426055 |
期刊: | IEEE ELECTRON DEVICE LETTERS |
Volume: | 36 |
起始頁: | 558 |
結束頁: | 560 |
Appears in Collections: | Articles |