標題: 3D Vertical TaOx/TiO2 RRAM with over 10(3) Self-Rectifying Ratio and Sub-mu A Operating Current
作者: Hsu, Chung-Wei
Wan, Chia-Chen
Wang, I-Ting
Chen, Mei-Chin
Lo, Chun-Li
Lee, Yao-Jen
Jang, Wen-Yueh
Lin, Chen-Hsi
Hou, Tuo-Hung
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
公開日期: 1-一月-2013
摘要: The 3D double-layer vertical RRAM with ultralow sub-mu A operating current and high self-rectifying ratio over 10(3) has been demonstrated for the first time. This Ta/TaOx/TiO2/Ti interfacial switching device overcomes the intrinsic trade-off between operating current and variability in filamentary RRAMs and shows promising potential for high-density data storage.
URI: http://hdl.handle.net/11536/124957
ISBN: 978-1-4799-2306-9
ISSN: 
期刊: 2013 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM)
顯示於類別:會議論文