標題: | 3D Vertical TaOx/TiO2 RRAM with over 10(3) Self-Rectifying Ratio and Sub-mu A Operating Current |
作者: | Hsu, Chung-Wei Wan, Chia-Chen Wang, I-Ting Chen, Mei-Chin Lo, Chun-Li Lee, Yao-Jen Jang, Wen-Yueh Lin, Chen-Hsi Hou, Tuo-Hung 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
公開日期: | 1-一月-2013 |
摘要: | The 3D double-layer vertical RRAM with ultralow sub-mu A operating current and high self-rectifying ratio over 10(3) has been demonstrated for the first time. This Ta/TaOx/TiO2/Ti interfacial switching device overcomes the intrinsic trade-off between operating current and variability in filamentary RRAMs and shows promising potential for high-density data storage. |
URI: | http://hdl.handle.net/11536/124957 |
ISBN: | 978-1-4799-2306-9 |
ISSN: | |
期刊: | 2013 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM) |
顯示於類別: | 會議論文 |