標題: | Modified reflectance-transmittance method for the metrology of thin film optical properties |
作者: | Yeh, KT Lin, CH Hu, JR Loong, WA 應用化學系 Department of Applied Chemistry |
關鍵字: | refraction;extinction coefficient;modified R-T method;VASE;n and k analyzer |
公開日期: | 1-三月-2006 |
摘要: | Because the surface roughness of a thin film will cause light scattering, the reflectance (R) and transmittance (T) measured using a UV/visible (vis) spectrometer become lower than the actual values. The deviation becomes larger with increasing roughness and decreasing wavelength of incident light. Hence, it is necessary to correct measured R and T using roughness as a modification factor. The refraction (n) and extinction coefficient (k) obtained by the modified R-T method are closer to those results obtained using a variable angle spectroscopic ellipsometer (VASE), which provides more precise results than a n and k analyzer. |
URI: | http://dx.doi.org/10.1143/JJAP.45.1566 http://hdl.handle.net/11536/12592 |
ISSN: | 0021-4922 |
DOI: | 10.1143/JJAP.45.1566 |
期刊: | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS |
Volume: | 45 |
Issue: | 3A |
起始頁: | 1566 |
結束頁: | 1569 |
顯示於類別: | 期刊論文 |