標題: | The optical properties of monolayer amorphous Al2O3-TiO2 composite films used as HT-APSM blanks for ArF immersion lithography |
作者: | Lai, Fu-Der Huang, C. Y. Ko, Fu-Hsiang 材料科學與工程學系奈米科技碩博班 Graduate Program of Nanotechnology , Department of Materials Science and Engineering |
關鍵字: | composite film;high transmittance attenuated phase shift mask;ArF immersion lithography;optical property |
公開日期: | 1-五月-2007 |
摘要: | Amorphous (Al2O3)(x)-(TiO2)(1-x) composite films are prepared using r.f. unbalanced magnetron sputtering in an atmosphere of argon and oxygen at room temperature. The optical constants of (Al2O3)(x)-(TiO2)(1-x) composite films are linearly dependent on the Al2O3 mole fraction in the Al2O3-TiO2 composite film. The optical constants of these Al2O3-TiO2 Composite films can be made to meet the optical requirements for a high transmittance attenuated phase shift mask (HT-APSM) blank by tuning the Al2O3 mole fraction. The Al2O3 mole fraction range that would allow the films to meet the optical requirements of an HT-APSM blank for ArF immersion lithography is calculated to be between 76% and 84%. One Tu-phase-shifted Al2O3-TiO2 composite thin film to be used as an HT-APSM blank for ArF immersion lithography is fabricated and is shown to satisfy the optical requirements. (c) 2007 Elsevier B.V. All rights reserved. |
URI: | http://dx.doi.org/10.1016/j.mee.2007.01.214 http://hdl.handle.net/11536/4697 |
ISSN: | 0167-9317 |
DOI: | 10.1016/j.mee.2007.01.214 |
期刊: | MICROELECTRONIC ENGINEERING |
Volume: | 84 |
Issue: | 5-8 |
起始頁: | 716 |
結束頁: | 720 |
顯示於類別: | 會議論文 |