標題: The optical properties of monolayer amorphous Al2O3-TiO2 composite films used as HT-APSM blanks for ArF immersion lithography
作者: Lai, Fu-Der
Huang, C. Y.
Ko, Fu-Hsiang
材料科學與工程學系奈米科技碩博班
Graduate Program of Nanotechnology , Department of Materials Science and Engineering
關鍵字: composite film;high transmittance attenuated phase shift mask;ArF immersion lithography;optical property
公開日期: 1-五月-2007
摘要: Amorphous (Al2O3)(x)-(TiO2)(1-x) composite films are prepared using r.f. unbalanced magnetron sputtering in an atmosphere of argon and oxygen at room temperature. The optical constants of (Al2O3)(x)-(TiO2)(1-x) composite films are linearly dependent on the Al2O3 mole fraction in the Al2O3-TiO2 composite film. The optical constants of these Al2O3-TiO2 Composite films can be made to meet the optical requirements for a high transmittance attenuated phase shift mask (HT-APSM) blank by tuning the Al2O3 mole fraction. The Al2O3 mole fraction range that would allow the films to meet the optical requirements of an HT-APSM blank for ArF immersion lithography is calculated to be between 76% and 84%. One Tu-phase-shifted Al2O3-TiO2 composite thin film to be used as an HT-APSM blank for ArF immersion lithography is fabricated and is shown to satisfy the optical requirements. (c) 2007 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.mee.2007.01.214
http://hdl.handle.net/11536/4697
ISSN: 0167-9317
DOI: 10.1016/j.mee.2007.01.214
期刊: MICROELECTRONIC ENGINEERING
Volume: 84
Issue: 5-8
起始頁: 716
結束頁: 720
顯示於類別:會議論文


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