標題: | A novel method for growing polycrystalline Ge layer by using UHVCVD |
作者: | Tu, CH Chang, TC Liu, PT Yang, TH Zan, HW Chang, CY 電子工程學系及電子研究所 顯示科技研究所 Department of Electronics Engineering and Institute of Electronics Institute of Display |
關鍵字: | UHVCVD;polycrystalline;germanium |
公開日期: | 24-二月-2006 |
摘要: | Poly-Ge grown on SiO2 substrates by using one-step ultra-high vacuum chemical vapor deposition (UHVCVD) process with thin Si nucleation layers at very low deposition temperature (350 degrees C) was demonstrated. The results demonstrated that the polycrystalline silicon (poly-Si) nucleation layer is needed for the growth of polycrystalline germanium (poly-Ge) on SiO2 substrates at low growth temperature. SEM image presents the films with uniform rain size and uniform thickness occurring in the samples. The grain size of poly-Ge is about 100 nm. The Raman shift spectrum and XRD spectrum also identified that films are high quality poly-Ge by using this method. (c) 2005 Elsevier B.V. All rights reserved. |
URI: | http://dx.doi.org/10.1016/j.surfcoat.2005.07.026 http://hdl.handle.net/11536/12614 |
ISSN: | 0257-8972 |
DOI: | 10.1016/j.surfcoat.2005.07.026 |
期刊: | SURFACE & COATINGS TECHNOLOGY |
Volume: | 200 |
Issue: | 10 |
起始頁: | 3261 |
結束頁: | 3264 |
顯示於類別: | 會議論文 |