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dc.contributor.author許博揚en_US
dc.contributor.authorHsu, Po-Yangen_US
dc.contributor.author趙天生en_US
dc.contributor.authorChao, Tien-Shengen_US
dc.date.accessioned2015-11-26T00:57:09Z-
dc.date.available2015-11-26T00:57:09Z-
dc.date.issued2015en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#GT070252033en_US
dc.identifier.urihttp://hdl.handle.net/11536/126949-
dc.language.isoen_USen_US
dc.subject穿隧式薄膜場效電晶體zh_TW
dc.subject電漿處理zh_TW
dc.subject熱載子可靠度zh_TW
dc.subjectT-TFTen_US
dc.subjectPlasma treatmenten_US
dc.subjectHot carrier reliabilityen_US
dc.title電漿表面處理對多晶矽穿隧式薄膜電晶體之影響zh_TW
dc.titleEffect of Plasma Surface Treatment on Polycrystalline-Silicon Tunnel Thin-Film Transistoren_US
dc.typeThesisen_US
dc.contributor.department電子物理系所zh_TW
Appears in Collections:Thesis