電漿表面處理對多晶矽穿隧式薄膜電晶體之影響

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	許博揚	en_US
dc.contributor.author	Hsu, Po-Yang	en_US
dc.contributor.author	趙天生	en_US
dc.contributor.author	Chao, Tien-Sheng	en_US
dc.date.accessioned	2015-11-26T00:57:09Z	-
dc.date.available	2015-11-26T00:57:09Z	-
dc.date.issued	2015	en_US
dc.identifier.uri	http://140.113.39.130/cdrfb3/record/nctu/#GT070252033	en_US
dc.identifier.uri	http://hdl.handle.net/11536/126949	-
dc.language.iso	en_US	en_US
dc.subject	穿隧式薄膜場效電晶體	zh_TW
dc.subject	電漿處理	zh_TW
dc.subject	熱載子可靠度	zh_TW
dc.subject	T-TFT	en_US
dc.subject	Plasma treatment	en_US
dc.subject	Hot carrier reliability	en_US
dc.title	電漿表面處理對多晶矽穿隧式薄膜電晶體之影響	zh_TW
dc.title	Effect of Plasma Surface Treatment on Polycrystalline-Silicon Tunnel Thin-Film Transistor	en_US
dc.type	Thesis	en_US
dc.contributor.department	電子物理系所	zh_TW
顯示於類別：	畢業論文