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dc.contributor.authorLiu, CYen_US
dc.contributor.authorChuang, CCen_US
dc.contributor.authorChen, JSen_US
dc.contributor.authorWang, Aen_US
dc.contributor.authorJang, WYen_US
dc.contributor.authorYoung, JCen_US
dc.contributor.authorChiu, KYen_US
dc.contributor.authorTseng, TYen_US
dc.date.accessioned2014-12-08T15:17:34Z-
dc.date.available2014-12-08T15:17:34Z-
dc.date.issued2006-01-03en_US
dc.identifier.issn0040-6090en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.tsf.2005.08.153en_US
dc.identifier.urihttp://hdl.handle.net/11536/12748-
dc.description.abstractV-doped SrZrO3 (SZO) thin films on LaNiO3/SiO2/Si substrate are synthesized by sol-gel method to form metal-insulator-metal (MIM) sandwich structure. The physical and electrical properties of the MIM device are studied. The structure and surface morphology of the SZO films are also characterized by X-ray diffraction and scanning electron microscopy. Such a device has the bistable switching properties of current-voltage characteristics. The resistive switching between high state and low state can also be operated with voltage pulses. The device with the properties of long retention time and non-destructive readout is expected to be suitable for nonvolatile memory application. (c) 2005 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectSrZrO3en_US
dc.subjectmemory effecten_US
dc.subjectnonvolatile memoryen_US
dc.subjectRRAMen_US
dc.titleMemory effect of sol-gel derived V-doped SrZrO3 thin filmsen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1016/j.tsf.2005.08.153en_US
dc.identifier.journalTHIN SOLID FILMSen_US
dc.citation.volume494en_US
dc.citation.issue1-2en_US
dc.citation.spage287en_US
dc.citation.epage290en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000233785600053-
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