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dc.contributor.authorHsu, Hsiao-Hsuanen_US
dc.contributor.authorYen, Shiang-Shiouen_US
dc.contributor.authorChiu, Yu-Chienen_US
dc.contributor.authorChiou, Pingen_US
dc.contributor.authorChang, Chun-Yenen_US
dc.contributor.authorCheng, Chun-Huen_US
dc.contributor.authorLai, Yu-Chienen_US
dc.contributor.authorChang, Chih-Pangen_US
dc.contributor.authorLu, Hsueh-Hsingen_US
dc.contributor.authorChuang, Ching-Sangen_US
dc.contributor.authorLin, Yu-Hsinen_US
dc.date.accessioned2015-12-02T02:59:16Z-
dc.date.available2015-12-02T02:59:16Z-
dc.date.issued2015-09-15en_US
dc.identifier.issn0925-8388en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.jallcom.2014.12.207en_US
dc.identifier.urihttp://hdl.handle.net/11536/127977-
dc.description.abstractA low off-state current of 1.6 x 10(-14) A/mu m and a small subthreshold gate swing of 152 mV/decade were achieved in a novel thin film transistor using a c-axis crystallized InGaZnO semiconductor that could be obtained at a low substrate temperature range of 150 degrees C. From experimental results, we found that the lowered off-state current is mainly attributed to the formation of rich Ga-O bonds to reduce oxygen vacancies, and the c-axis crystallized structure of IGZO to increase the potential barrier on the source side due to the increase of local trap states at the grain boundary. (C) 2015 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectInGaZnOen_US
dc.subjectCompounden_US
dc.subjectCrystalen_US
dc.subjectThin film transistoren_US
dc.titleCorrelation of thermal annealing effect, crystallinity and electrical characteristics in c-axis crystallized InGaZnO thin-film transistorsen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.jallcom.2014.12.207en_US
dc.identifier.journalJOURNAL OF ALLOYS AND COMPOUNDSen_US
dc.citation.volume643en_US
dc.citation.spageS187en_US
dc.citation.epageS192en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000357903400034en_US
dc.citation.woscount0en_US
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