完整後設資料紀錄
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dc.contributor.authorJian, S. -R.en_US
dc.contributor.authorChang, H. -W.en_US
dc.contributor.authorWang, Y. -W.en_US
dc.contributor.authorYeh, H. -H.en_US
dc.contributor.authorJuang, J. -Y.en_US
dc.date.accessioned2015-12-02T02:59:27Z-
dc.date.available2015-12-02T02:59:27Z-
dc.date.issued2015-11-05en_US
dc.identifier.issn0925-8388en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.jallcom.2015.07.064en_US
dc.identifier.urihttp://hdl.handle.net/11536/128209-
dc.description.abstractThe effects of post-annealing on the microstructures, surface morphologies and nanomechanical characteristics of FePd thin films are investigated by means of X-ray diffraction (XRD), atomic force microscopy (AFM), transmission electron microscopy (TEM) and nanoindentation techniques. The FePd thin films were deposited on the glass substrates at room temperature by magnetron sputtering system. Post-annealing was carried out at 500, 600 and 700 degrees C, respectively, resulting in progressive increase of the average grain size and surface roughness of FePd thin films, as well as the improved film crystallinity. XRD results show that FePd thin films are predominantly (111)-oriented, indicating a well-ordered microstructure. The hardness and Young\'s modulus of FePd thin films measured by a Berkovich nanoindenter operated with the continuous contact stiffness measurements (CSM) option indicated that both mechanical properties are decreased with increasing the annealing temperature. Furthermore, the relationship between the hardness and films grain size appears to follow closely with the Hall-Petch equation. (C) 2015 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectFePd thin filmsen_US
dc.subjectXRDen_US
dc.subjectAFMen_US
dc.subjectTEMen_US
dc.subjectNanoindentationen_US
dc.subjectHardnessen_US
dc.titleEffects of post-annealing on the structural and nanomechanical properties of sputter-deposited FePd thin filmsen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.jallcom.2015.07.064en_US
dc.identifier.journalJOURNAL OF ALLOYS AND COMPOUNDSen_US
dc.citation.volume648en_US
dc.citation.spage980en_US
dc.citation.epage985en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000361158300140en_US
dc.citation.woscount0en_US
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