標題: Influence of Post-Annealing on the Structural and Nanomechanical Properties of Co Thin Films
作者: Hwang, Yeong-Maw
Pan, Cheng-Tang
Lu, Ying-Xu
Jian, Sheng-Rui
Chang, Huang-Wei
Juang, Jenh-Yih
電子物理學系
Department of Electrophysics
關鍵字: Co thin films;XRD;pop-in;nanoindentation
公開日期: 1-二月-2020
摘要: The correlations between the microstructure and nanomechanical properties of a series of thermal annealed Co thin films were investigated. The Co thin films were deposited on glass substrates using a magnetron sputtering system at ambient conditions followed by subsequent annealing conducted at various temperatures ranging from 300 degrees C to 800 degrees C. The XRD results indicated that for annealing temperature in the ranged from 300 degrees C to 500 degrees C, the Co thin films were of single hexagonal close-packed (hcp) phase. Nevertheless, the coexistence of hcp-Co (002) and face-centered cubic (fcc-Co (111)) phases was evidently observed for films annealed at 600 degrees C. Further increasing the annealing temperature to 700 degrees C and 800 degrees C, the films evidently turned into fcc-Co (111). Moreover, significant variations in the hardness and Young's modulus are observed by continuous stiffness nanoindentation measurement for films annealed at different temperatures. The correlations between structures and properties are discussed.
URI: http://dx.doi.org/10.3390/mi11020180
http://hdl.handle.net/11536/154202
DOI: 10.3390/mi11020180
期刊: MICROMACHINES
Volume: 11
Issue: 2
起始頁: 0
結束頁: 0
顯示於類別:期刊論文