標題: | Influence of Post-Annealing on the Structural and Nanomechanical Properties of Co Thin Films |
作者: | Hwang, Yeong-Maw Pan, Cheng-Tang Lu, Ying-Xu Jian, Sheng-Rui Chang, Huang-Wei Juang, Jenh-Yih 電子物理學系 Department of Electrophysics |
關鍵字: | Co thin films;XRD;pop-in;nanoindentation |
公開日期: | 1-二月-2020 |
摘要: | The correlations between the microstructure and nanomechanical properties of a series of thermal annealed Co thin films were investigated. The Co thin films were deposited on glass substrates using a magnetron sputtering system at ambient conditions followed by subsequent annealing conducted at various temperatures ranging from 300 degrees C to 800 degrees C. The XRD results indicated that for annealing temperature in the ranged from 300 degrees C to 500 degrees C, the Co thin films were of single hexagonal close-packed (hcp) phase. Nevertheless, the coexistence of hcp-Co (002) and face-centered cubic (fcc-Co (111)) phases was evidently observed for films annealed at 600 degrees C. Further increasing the annealing temperature to 700 degrees C and 800 degrees C, the films evidently turned into fcc-Co (111). Moreover, significant variations in the hardness and Young's modulus are observed by continuous stiffness nanoindentation measurement for films annealed at different temperatures. The correlations between structures and properties are discussed. |
URI: | http://dx.doi.org/10.3390/mi11020180 http://hdl.handle.net/11536/154202 |
DOI: | 10.3390/mi11020180 |
期刊: | MICROMACHINES |
Volume: | 11 |
Issue: | 2 |
起始頁: | 0 |
結束頁: | 0 |
顯示於類別: | 期刊論文 |