標題: Microchannel Wetting for Controllable Patterning and Alignment of Silver Nanowire with High Resolution
作者: Yang, Bo-Ru
Cao, Wu
Liu, Gui-Shi
Chen, Hui-Jiuan
Noh, Yong-Young
Minari, Takeo
Hsiao, Hsiang-Chih
Lee, Chia-Yu
Shieh, Han-Ping D.
Liu, Chuan
光電工程學系
Department of Photonics
關鍵字: fluoropolymer;microchannel;self-assembly patterning;alignment;silver nanowires
公開日期: 30-九月-2015
摘要: Patterning and alignment of conductive nanowires are essential for good electrical isolation and high conductivity in various applications. Herein a facile bottom-up, additive technique is developed to pattern and align silver nanowires (AgNWs) by manipulating wetting of dispersions in microchannels. By forming hydrophobic/hydrophilic micropatterns down to 8 mu m with fiuoropolymer (Cytop) and SiO2, the aqueous AgNW dispersions with the optimized surface tension and viscosity self-assemble into microdroplets and then dry to form anisotropic AgNW networks. The alignment degree characterized by the full width at half-maximum (FWHM) can be well-controlled from 39.8 degrees to 84.1 degrees by changing the width of microchannels. A mechanism is proposed and validated by statistical analysis on AgNW alignment, and a static model is proposed to guide the patterning of general NWs. The alignment reduced well the electrical resistivity of AgNW networks by a factor of 5 because of the formation of efficient percolation path for carrier conduction.
URI: http://dx.doi.org/10.1021/acsami.5b06370
http://hdl.handle.net/11536/128270
ISSN: 1944-8244
DOI: 10.1021/acsami.5b06370
期刊: ACS APPLIED MATERIALS & INTERFACES
Issue: 38
起始頁: 21433
結束頁: 21441
顯示於類別:期刊論文