標題: | Microchannel Wetting for Controllable Patterning and Alignment of Silver Nanowire with High Resolution |
作者: | Yang, Bo-Ru Cao, Wu Liu, Gui-Shi Chen, Hui-Jiuan Noh, Yong-Young Minari, Takeo Hsiao, Hsiang-Chih Lee, Chia-Yu Shieh, Han-Ping D. Liu, Chuan 光電工程學系 Department of Photonics |
關鍵字: | fluoropolymer;microchannel;self-assembly patterning;alignment;silver nanowires |
公開日期: | 30-九月-2015 |
摘要: | Patterning and alignment of conductive nanowires are essential for good electrical isolation and high conductivity in various applications. Herein a facile bottom-up, additive technique is developed to pattern and align silver nanowires (AgNWs) by manipulating wetting of dispersions in microchannels. By forming hydrophobic/hydrophilic micropatterns down to 8 mu m with fiuoropolymer (Cytop) and SiO2, the aqueous AgNW dispersions with the optimized surface tension and viscosity self-assemble into microdroplets and then dry to form anisotropic AgNW networks. The alignment degree characterized by the full width at half-maximum (FWHM) can be well-controlled from 39.8 degrees to 84.1 degrees by changing the width of microchannels. A mechanism is proposed and validated by statistical analysis on AgNW alignment, and a static model is proposed to guide the patterning of general NWs. The alignment reduced well the electrical resistivity of AgNW networks by a factor of 5 because of the formation of efficient percolation path for carrier conduction. |
URI: | http://dx.doi.org/10.1021/acsami.5b06370 http://hdl.handle.net/11536/128270 |
ISSN: | 1944-8244 |
DOI: | 10.1021/acsami.5b06370 |
期刊: | ACS APPLIED MATERIALS & INTERFACES |
Issue: | 38 |
起始頁: | 21433 |
結束頁: | 21441 |
顯示於類別: | 期刊論文 |