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dc.contributor.authorHsu, Ching-Hsiangen_US
dc.contributor.authorChang, Edward Yien_US
dc.contributor.authorChang, Hsun-Juien_US
dc.contributor.authorMaa, Jer-Shenen_US
dc.contributor.authorPande, Krishnaen_US
dc.date.accessioned2015-12-02T02:59:34Z-
dc.date.available2015-12-02T02:59:34Z-
dc.date.issued2015-12-01en_US
dc.identifier.issn0038-1101en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.sse.2015.09.017en_US
dc.identifier.urihttp://hdl.handle.net/11536/128368-
dc.description.abstractThe reliability of III-V solar cell with copper based contacts as low-cost metallurgy option for solar cells including Cu-based Cu/Ge/Pd contact on n-type GaAs and Cu/Pt/Ti/Pt contact on p-type Ge is studied in this paper. The Cu-based contacts have low specific contact resistances of the order of 10(-6) Omega cm(2). The solar cells with the proposed Cu-based structures were subjected to high-temperature annealing (250 degrees C) and a high DC current (6.5 x 10(-4) mA/mu m(2)) stress test. Overall, the solar cell adopting these Cu-based contacts remained quite stable and demonstrated excellent performances after these reliability tests. (C) 2015 Elsevier Ltd. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectReliabilityen_US
dc.subjectIII-V concentrator solar cellen_US
dc.subjectCopper metallizationen_US
dc.subjectLow costen_US
dc.titleThe reliability study of III-V solar cell with copper based contactsen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.sse.2015.09.017en_US
dc.identifier.journalSOLID-STATE ELECTRONICSen_US
dc.citation.volume114en_US
dc.citation.spage174en_US
dc.citation.epage177en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department照明與能源光電研究所zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentInstitute of Lighting and Energy Photonicsen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000363193300031en_US
dc.citation.woscount0en_US
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