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dc.contributor.authorPearn, W. L.en_US
dc.contributor.authorTai, Y. T.en_US
dc.contributor.authorKao, C. M.en_US
dc.date.accessioned2015-12-02T02:59:41Z-
dc.date.available2015-12-02T02:59:41Z-
dc.date.issued2015-07-01en_US
dc.identifier.issn0090-3973en_US
dc.identifier.urihttp://dx.doi.org/10.1520/JTE20140012en_US
dc.identifier.urihttp://hdl.handle.net/11536/128446-
dc.description.abstractIn recent years, since portable devices with thin and light designs are essential, the applications of the thin-film transistor liquid crystal display (TFT-LCD) have been applied extensively. Process yield is the most common criterion used in the TFT-LCD manufacturing industry for measuring process performance. The measurement index Spk establishes the relationship between the manufacturing specifications and the actual process performance, which provides an exact measure on process yield. In this paper, we provide two convenient ratio approaches to calculate the lower confidence bounds and critical values extensively for various values of alpha-risk, capability requirements, and sample sizes. Practitioners can use the proposed ratio approaches and procedures to determine whether their process meets the preset capability requirement and make reliable decisions. The convenient ratio approaches can bridge the gap between the theoretical development and factory applications for evaluation of process yields.en_US
dc.language.isoen_USen_US
dc.subjectprocess yielden_US
dc.subjectratio approachen_US
dc.subjectlower confidence bounden_US
dc.subjectcritical valueen_US
dc.titleConvenient Ratio Approach for Industrial Implementation in Estimating and Testing Process Yielden_US
dc.typeArticleen_US
dc.identifier.doi10.1520/JTE20140012en_US
dc.identifier.journalJOURNAL OF TESTING AND EVALUATIONen_US
dc.citation.volume43en_US
dc.citation.spage917en_US
dc.citation.epage923en_US
dc.contributor.department統計學研究所zh_TW
dc.contributor.department工業工程與管理學系zh_TW
dc.contributor.departmentInstitute of Statisticsen_US
dc.contributor.departmentDepartment of Industrial Engineering and Managementen_US
dc.identifier.wosnumberWOS:000364050800023en_US
dc.citation.woscount0en_US
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