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dc.contributor.authorYu, HCen_US
dc.contributor.authorWang, JSen_US
dc.contributor.authorSu, YKen_US
dc.contributor.authorChang, SJen_US
dc.contributor.authorLai, FIen_US
dc.contributor.authorChang, YHen_US
dc.contributor.authorKuo, HCen_US
dc.contributor.authorSung, CPen_US
dc.contributor.authorYang, HPDen_US
dc.contributor.authorLin, KFen_US
dc.contributor.authorWang, JMen_US
dc.contributor.authorChi, JYen_US
dc.contributor.authorHsiao, RSen_US
dc.contributor.authorMikhrin, Sen_US
dc.date.accessioned2014-12-08T15:17:42Z-
dc.date.available2014-12-08T15:17:42Z-
dc.date.issued2006-01-01en_US
dc.identifier.issn1041-1135en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LPT.2005.863166en_US
dc.identifier.urihttp://hdl.handle.net/11536/12847-
dc.description.abstractWe report InAs-InGaAs quantum-dot vertical-cavity surface-emitting lasers (VCSELs) grown by molecular beam epitaxy with fully doped n- and p-doped AlGaAs distributed Bragg reflectors and including an AlAs layer to form a current and waveguiding aperture. The metal contacts are deposited on a topmost p(+) (GaAs)-Ga-. contact layer and on the bottom surface of the n(+)-GaAs substrate. This conventional selectively oxidized top-emitting device configuration avoids the added complexity of fabricating intracavity or coplanar ohmic contacts. The VCSELs operate continuous-wave at room temperature with peak output powers of 0.33 mW and differential slope efficiencies up to 0.23 W/A. The peak lasing wavelengths are near 1.275 mu m, with a sidemode suppression ratio of 28 dB.en_US
dc.language.isoen_USen_US
dc.subjectfully doped distributed Bragg reflector (DBR)en_US
dc.subjectInAs quantum dot (QD)en_US
dc.subjectmolecular beam epitaxy (NME)en_US
dc.subjectvertical-cavity surface-emitting laser (VCSEL)en_US
dc.title1.3-mu m InAs-InGaAs quantum-dot vertical-cavity surface-emitting laser with fully doped DBRs grown by MBEen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LPT.2005.863166en_US
dc.identifier.journalIEEE PHOTONICS TECHNOLOGY LETTERSen_US
dc.citation.volume18en_US
dc.citation.issue1-4en_US
dc.citation.spage418en_US
dc.citation.epage420en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000235899300138-
dc.citation.woscount30-
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