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dc.contributor.authorPeng, WCen_US
dc.contributor.authorWu, YSen_US
dc.date.accessioned2014-12-08T15:17:42Z-
dc.date.available2014-12-08T15:17:42Z-
dc.date.issued2006-01-01en_US
dc.identifier.issn1041-1135en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LPT.2006.870190en_US
dc.identifier.urihttp://hdl.handle.net/11536/12848-
dc.description.abstractVertical InGaN-GaN light-emitting diodes (LEDs) epitaxial films were successfully fabricated on a 50-mm Si substrate using glue bonding and laser liftoff technology. A high-temperature stable organic film, rather than a solder metal, was used as the bonding agent. It was found that the light output of the vertical InGaN LED chip exceeded that of the conventional sapphire-substrate LEDs by about 20% at an injection current of 20 mA. The vertical InGaN LEDs operated at a much higher injection forward current (280 mA) than sapphire-substrate LEDs (180 mA). The radiation pattern of the vertical InGaN LEDs is more symmetrical than that of the sapphire-substrate LEDs. Furthermore, the vertical InGaN LEDs remain highly reliable after 1000 h of testing.en_US
dc.language.isoen_USen_US
dc.subjectglue bondingen_US
dc.subjectInGaN-GaNen_US
dc.subjectlaser liftoffen_US
dc.subjectlight-emitting diodes (LEDs)en_US
dc.titlePerformance of InGaN-GaN LEDs fabricated using glue bonding on 50-mm Si substrateen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LPT.2006.870190en_US
dc.identifier.journalIEEE PHOTONICS TECHNOLOGY LETTERSen_US
dc.citation.volume18en_US
dc.citation.issue1-4en_US
dc.citation.spage613en_US
dc.citation.epage615en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000235899300201-
dc.citation.woscount14-
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