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dc.contributor.authorChan, Ren-Jiaen_US
dc.contributor.authorGuo, Jyh-Chen_US
dc.date.accessioned2015-12-02T03:00:57Z-
dc.date.available2015-12-02T03:00:57Z-
dc.date.issued2014-01-01en_US
dc.identifier.isbn978-2-87487-036-1en_US
dc.identifier.issnen_US
dc.identifier.urihttp://hdl.handle.net/11536/128585-
dc.description.abstractAnalytical models of skin effect and proximity effect were developed in this paper to calculate and predict the frequency dependent resistance, Re(Z(in)) and Q for mm-wave inductor design. The derived models incorporate layout and material parameters, and frequency in an explicit form suitable for circuit simulation. The accuracy has been proven by a close match with Re(Z(in)) and Q measured from mm-wave inductor (L-dc similar to 150pH, Q(max)similar to 17, f(SR)>> 65GHz) fabricated by 65nm CMOS process with 0.9 mu m standard top metal.en_US
dc.language.isoen_USen_US
dc.subjectAnalytical modelen_US
dc.subjectskinen_US
dc.subjectproximityen_US
dc.subjectmm-wave inductoren_US
dc.subjectCMOSen_US
dc.titleAnalysis and Modeling of Skin and Proximity Effects for Millimeter-Wave Inductors Design in Nanoscale Si CMOSen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2014 9TH EUROPEAN MICROWAVE INTEGRATED CIRCUIT CONFERENCE (EUMIC)en_US
dc.citation.spage13en_US
dc.citation.epage16en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000361635500004en_US
dc.citation.woscount0en_US
Appears in Collections:Conferences Paper