Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Chan, Ren-Jia | en_US |
| dc.contributor.author | Guo, Jyh-Ch | en_US |
| dc.date.accessioned | 2015-12-02T03:00:57Z | - |
| dc.date.available | 2015-12-02T03:00:57Z | - |
| dc.date.issued | 2014-01-01 | en_US |
| dc.identifier.isbn | 978-2-87487-036-1 | en_US |
| dc.identifier.issn | en_US | |
| dc.identifier.uri | http://hdl.handle.net/11536/128585 | - |
| dc.description.abstract | Analytical models of skin effect and proximity effect were developed in this paper to calculate and predict the frequency dependent resistance, Re(Z(in)) and Q for mm-wave inductor design. The derived models incorporate layout and material parameters, and frequency in an explicit form suitable for circuit simulation. The accuracy has been proven by a close match with Re(Z(in)) and Q measured from mm-wave inductor (L-dc similar to 150pH, Q(max)similar to 17, f(SR)>> 65GHz) fabricated by 65nm CMOS process with 0.9 mu m standard top metal. | en_US |
| dc.language.iso | en_US | en_US |
| dc.subject | Analytical model | en_US |
| dc.subject | skin | en_US |
| dc.subject | proximity | en_US |
| dc.subject | mm-wave inductor | en_US |
| dc.subject | CMOS | en_US |
| dc.title | Analysis and Modeling of Skin and Proximity Effects for Millimeter-Wave Inductors Design in Nanoscale Si CMOS | en_US |
| dc.type | Proceedings Paper | en_US |
| dc.identifier.journal | 2014 9TH EUROPEAN MICROWAVE INTEGRATED CIRCUIT CONFERENCE (EUMIC) | en_US |
| dc.citation.spage | 13 | en_US |
| dc.citation.epage | 16 | en_US |
| dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
| dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
| dc.identifier.wosnumber | WOS:000361635500004 | en_US |
| dc.citation.woscount | 0 | en_US |
| Appears in Collections: | Conferences Paper | |

