完整後設資料紀錄
DC 欄位 | 值 | 語言 |
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dc.contributor.author | Fatah, Faiz Aizad | en_US |
dc.contributor.author | Lin, Yueh-Chin | en_US |
dc.contributor.author | Lee, Tsung-Yun | en_US |
dc.contributor.author | Yang, Kai-Chun | en_US |
dc.contributor.author | Liu, Ren-Xuan | en_US |
dc.contributor.author | Chan, Jing-Ray | en_US |
dc.contributor.author | Hsu, Heng-Tung | en_US |
dc.contributor.author | Miyamoto, Yasuyuki | en_US |
dc.contributor.author | Chang, Edward Yi | en_US |
dc.date.accessioned | 2016-03-28T00:04:14Z | - |
dc.date.available | 2016-03-28T00:04:14Z | - |
dc.date.issued | 2015-01-01 | en_US |
dc.identifier.issn | 2162-8769 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1149/2.0171512jss | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/129447 | - |
dc.description.abstract | In this study, a 60-nm enhancement-mode (E-mode) In0.65Ga0.35As/InAs/In0.65Ga0.35As high electron mobility transistor (HEMT) was developed, and its potential for use inhigh-speed and low-power logic applications was investigated. When the E-mode device was biased at a drain-source voltage of 0.5 V, it demonstrated a cutoff frequency of 169 GHz, drain-induced barrier lowering of 70 mV/V, minimum subthreshold swing of 67 mV/decade, and ION/IOFF ratio greater than 1.6 x 10(4). The high performance of the E-mode device is attributed to the use of a thin barrier layer along with Pt gate sinking technology. These results confirm that E-mode In0.65Ga0.35As/InAs/In0.65Ga0.35As HEMTs have great potential for use inhigh-speed and low-power logic applications. (C) 2015 The Electrochemical Society. All rights reserved. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Potential of Enhancement Mode In0.65Ga0.35As/InAs/In0.65Ga0.35As HEMTs for Using in High-Speed and Low-Power Logic Applications | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1149/2.0171512jss | en_US |
dc.identifier.journal | ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY | en_US |
dc.citation.issue | 12 | en_US |
dc.citation.spage | N157 | en_US |
dc.citation.epage | N159 | en_US |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | 照明與能源光電研究所 | zh_TW |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.contributor.department | Institute of Lighting and Energy Photonics | en_US |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000364764700009 | en_US |
dc.citation.woscount | 0 | en_US |
顯示於類別: | 期刊論文 |