| Title: | 超低介電碳氮化矽薄膜之研究 Fabrication and Development of Ultra-Low-K Silcion Carbonitride Films |
| Authors: | 呂志鵬 Leu Jihperng 國立交通大學材料科學與工程學系（所） |
| Issue Date: | 2016 |
| Gov't Doc #: | MOST103-2221-E009-181-MY3 |
| URI: | http://hdl.handle.net/11536/130816 https://www.grb.gov.tw/search/planDetail?id=11723971&docId=480125 |
| Appears in Collections: | Research Plans |
- 超低介電碳氮化矽薄膜之研究 / 呂志鵬;Leu Jihperng
- 超低介電碳氮化矽薄膜之研究 / 呂志鵬;Leu Jihperng
- 利用電漿輔助化學氣相沉積系統製備低介電碳氮化矽薄膜之研究 / 凃弘恩;Tu, Hung-En;呂志鵬;Leu, Jihperng
- 紫外光輔助退火對電漿輔助化學氣相沉積低介電碳氮化矽薄膜之影響 / 鐘皓廷;呂志鵬;Chung, Hau-ting
- 以胺基鉭錯化合物經化學氣相沉積碳氮化鉭及氧化鉭薄膜 / 蔡智斌;Chih-Pin Tsai;裘性天;Hsin-Tien Chiu
- Embedded carbon bridges in low-k PECVD silicon carbonitride films using silazane precursors / Chang, Wei-Yuan;Chen, Wei-Zhong;Lee, Hung-Tse;Leu, Jihperng
- 電漿輔助化學氣相沉積碳氮化矽薄膜之光學性質:探討前驅物與沈積條件之影響 / 張倢妤;Chang, Chieh-Yu;呂志鵬;Leu, Jihperng
Loading...