完整後設資料紀錄
DC 欄位語言
dc.contributor.authorLin, Meng-Hanen_US
dc.contributor.authorWu, Ming-Chien_US
dc.contributor.authorLin, Chun-Chiehen_US
dc.contributor.authorTseng, Tseung-Yuenen_US
dc.date.accessioned2014-12-08T15:18:12Z-
dc.date.available2014-12-08T15:18:12Z-
dc.date.issued2009en_US
dc.identifier.issn0015-0193en_US
dc.identifier.urihttp://hdl.handle.net/11536/13167-
dc.identifier.urihttp://dx.doi.org/10.1080/00150190902870101en_US
dc.description.abstractNonpolar bistable resistive switching behaviors of sol-gel derived bismuth titanate oxide (BTO) thin film are investigated in this study. The BTO thin film memory device without thermal treatment shows higher resistance ratio (similar to 10(4)) than the other annealed devices. The resistive switching behavior of the Pt/BTO/LNO/Pt device is reproducible and can be traced over 100 times. Both low resistance state (ON-state) and high resistance state (OFF-state) are stable over 10(4) s under 0.3 V voltage stress at room temperature (RT) and 85 degrees C. The retention behaviors of both memory states in the Pt/BTO/LNO/Pt device are very stable over 2 x 10(6) s at RT and 85 degrees C, showing that the BTO thin film memory device is a good candidate for nonvolatile memory applicationen_US
dc.language.isoen_USen_US
dc.subjectRRAMen_US
dc.subjectbismuth titanate oxide (BTO)en_US
dc.subjectsol-gel methoden_US
dc.titleNonpolar Bistable Resistive Switching Behaviors of Bismuth Titanate Oxide Thin Filmen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1080/00150190902870101en_US
dc.identifier.journalFERROELECTRICSen_US
dc.citation.volume380en_US
dc.citation.spage30en_US
dc.citation.epage37en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000266720600005-
顯示於類別:會議論文


文件中的檔案:

  1. 000266720600005.pdf

若為 zip 檔案,請下載檔案解壓縮後,用瀏覽器開啟資料夾中的 index.html 瀏覽全文。