Title: Stresses and temperature stability of dense wavelength division multiplexing filters prepared by reactive ion-assisted e-gun evaporation
Authors: Wei, CT
Shieh, HPD
光電工程學系
顯示科技研究所
Department of Photonics
Institute of Display
Keywords: DWDM filters;reactive ion-assisted deposition;compression stress;Fabry-Perot filter;mutilayer
Issue Date: 1-Oct-2005
Abstract: In this paper, we report the in situ measurement of the temperature stability of narrow-band-pass filters on different types of substrate, for dense wavelength division multiplexing (DWDM) filters in optical-fiber transmission systems. The DWDM filters were designed as all-dielectric Fabry-Perot filters and fabricated by reactive ion-assisted deposition. Ta,05 and SiO(2) were used as high- and low-refractive-index layers, respectively, for constructing the DWDM filters. The accuracy and stability of the coating process were evaluated for fabricating the DWDM filters for the temperature stability of the center wavelength. The center wavelength shift was determined to be greatly dependent on the coefficient of thermal expansion of the substrate on which the filter is deposited.
URI: http://dx.doi.org/10.1143/JJAP.44.7577
http://hdl.handle.net/11536/13199
ISSN: 0021-4922
DOI: 10.1143/JJAP.44.7577
Journal: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS
Volume: 44
Issue: 10
Begin Page: 7577
End Page: 7581
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