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dc.contributor.author劉柏村en_US
dc.contributor.author范揚順en_US
dc.contributor.author陳鈞罄en_US
dc.date.accessioned2016-12-20T05:04:17Z-
dc.date.available2016-12-20T05:04:17Z-
dc.date.issued2016-03-16en_US
dc.identifier.govdocH01L027/115zh_TW
dc.identifier.govdocH01L021/28zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/132259-
dc.description.abstract一種記憶體結構,包含一控制單元以及一記憶單元電性連接至控制單元。控制單元包含一源極與一汲極;一主動層,接觸源極之一部分及汲極之一部分;一閘極層;以及一閘極絕緣層,位於主動層與閘極層之間。記憶單元包含一底電極層;一頂電極層;以及一電阻切換層,電阻切換層位於底電極層以及頂電極層之間,其中電阻切換層與主動層之材質為氧化鋁鋅錫。zh_TW
dc.language.isozh_TWen_US
dc.title記憶體結構及其製備方法zh_TW
dc.typePatentsen_US
dc.citation.patentcountryTWNzh_TW
dc.citation.patentnumber201611243zh_TW
Appears in Collections:Patents


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