Full metadata record
DC FieldValueLanguage
dc.contributor.authorWang, Yao-Chinen_US
dc.contributor.authorLin, Bor-Shyhen_US
dc.contributor.authorYang, Zu-Poen_US
dc.date.accessioned2017-04-21T06:56:47Z-
dc.date.available2017-04-21T06:56:47Z-
dc.date.issued2016-11en_US
dc.identifier.issn1551-319Xen_US
dc.identifier.urihttp://dx.doi.org/10.1109/JDT.2016.2594082en_US
dc.identifier.urihttp://hdl.handle.net/11536/132616-
dc.description.abstractFlexible and thinned glass substrates are two kinds of important substrates but are difficult to handle by conventional in-line sputtering system for mass production. Here, we designed and developed an in-line sputtering system for mass production that can handle these two kinds of substrates. The key of this success is the well heat management of this system. With the method of multiple cycles of deposition and cooling, this system demonstrated the deposition of thick copper film on flexible substrates at substrate temperature less than 120 degrees C. The thickness and cooling rate for one cycle are similar to 800 nm and 0.5 degrees C/s, respectively. Additionally, the processes of deposition and cooling are parallel in our system. By redesigning the mechanical structure of substrate carrier, the effect of the thermal stress change of substrate carrier on thinned glass substrates is minimized; therefore, our system can uniformly deposited ITO film on large-size thinned glass substrates. The values of sheet resistance, transmittance, and their uniformity are acceptable for industry. Moreover, all the processes of this system are automatic which is ready for mass production.en_US
dc.language.isoen_USen_US
dc.subjectflexible substrateen_US
dc.subjectLow temperature depositionen_US
dc.subjectsputtering systemen_US
dc.subjectthinned glass substrateen_US
dc.titleDevelop a Low-Temperature In-Line Sputtering System for Flexible and Thinned-Glass Substratesen_US
dc.identifier.doi10.1109/JDT.2016.2594082en_US
dc.identifier.journalJOURNAL OF DISPLAY TECHNOLOGYen_US
dc.citation.volume12en_US
dc.citation.issue11en_US
dc.citation.spage1388en_US
dc.citation.epage1392en_US
dc.contributor.department光電學院zh_TW
dc.contributor.department光電系統研究所zh_TW
dc.contributor.department影像與生醫光電研究所zh_TW
dc.contributor.departmentCollege of Photonicsen_US
dc.contributor.departmentInstitute of Photonic Systemen_US
dc.contributor.departmentInstitute of Imaging and Biomedical Photonicsen_US
dc.identifier.wosnumberWOS:000386256700019en_US
Appears in Collections:Articles