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dc.contributor.authorHsieh, Ying-Huien_US
dc.contributor.authorXue, Feien_US
dc.contributor.authorYang, Tiannanen_US
dc.contributor.authorLiu, Heng-Juien_US
dc.contributor.authorZhu, Yuanminen_US
dc.contributor.authorChen, Yi-Chunen_US
dc.contributor.authorZhan, Qianen_US
dc.contributor.authorDuan, Chun-Gangen_US
dc.contributor.authorChen, Long-Qingen_US
dc.contributor.authorHe, Qingen_US
dc.contributor.authorChu, Ying-Haoen_US
dc.date.accessioned2019-04-03T06:37:50Z-
dc.date.available2019-04-03T06:37:50Z-
dc.date.issued2016-10-26en_US
dc.identifier.issn2041-1723en_US
dc.identifier.urihttp://dx.doi.org/10.1038/ncomms13199en_US
dc.identifier.urihttp://hdl.handle.net/11536/132624-
dc.description.abstractNon-volatile electronic devices based on magnetoelectric multiferroics have triggered new possibilities of outperforming conventional devices for applications. However, ferroelectric reliability issues, such as imprint, retention and fatigue, must be solved before the realization of practical devices. In this study, everlasting ferroelectric retention in the heteroepitaxially constrained multiferroic mesocrystal is reported, suggesting a new approach to overcome the failure of ferroelectric retention. Studied by scanning probe microscopy and transmission electron microscopy, and supported via the phase-field simulations, the key to the success of ferroelectric retention is to prevent the crystal from ferroelastic deformation during the relaxation of the spontaneous polarization in a ferroelectric nanocrystal.en_US
dc.language.isoen_USen_US
dc.titlePermanent ferroelectric retention of BiFeO3 mesocrystalen_US
dc.typeArticleen_US
dc.identifier.doi10.1038/ncomms13199en_US
dc.identifier.journalNATURE COMMUNICATIONSen_US
dc.citation.volume7en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000386215600001en_US
dc.citation.woscount9en_US
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