完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Tsai, Hsu-Sheng | en_US |
dc.contributor.author | Hsiao, Ching-Hung | en_US |
dc.contributor.author | Lin, Yu-Pin | en_US |
dc.contributor.author | Chen, Chia-Wei | en_US |
dc.contributor.author | Ouyang, Hao | en_US |
dc.contributor.author | Liang, Jenq-Horng | en_US |
dc.date.accessioned | 2017-04-21T06:56:42Z | - |
dc.date.available | 2017-04-21T06:56:42Z | - |
dc.date.issued | 2016-10-12 | en_US |
dc.identifier.issn | 1613-6810 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1002/smll.201601915 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/132636 | - |
dc.language.iso | en_US | en_US |
dc.subject | borophene | en_US |
dc.subject | ion implantation | en_US |
dc.subject | plasma | en_US |
dc.title | Fabrication of Multilayer Borophene on Insulator Structure | en_US |
dc.identifier.doi | 10.1002/smll.201601915 | en_US |
dc.identifier.journal | SMALL | en_US |
dc.citation.volume | 12 | en_US |
dc.citation.issue | 38 | en_US |
dc.citation.spage | 5251 | en_US |
dc.citation.epage | 5255 | en_US |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.identifier.wosnumber | WOS:000386100900003 | en_US |
顯示於類別: | 期刊論文 |