標題: Chemical and structural investigation of zinc-oxo cluster photoresists for DUV lithography
作者: Yeh, Chun-Cheng
Liu, Hung-Chuan
Heni, Wajdi
Berling, Dominique
Zan, Hsiao-Wen
Soppera, Olivier
光電工程學系
Department of Photonics
公開日期: 14-Mar-2017
摘要: Metal oxo cluster photoresists have drawn a lot of attention in recent years due to their interesting properties combining the advantages of both inorganic and organic features. Their organic functionalities offer the possibility of patterning them by photon or electron beam lithography into metal oxide micro or nanostructures. Thanks to the inorganic metal oxide frameworks, these patterns show higher etch resistance and refractive index in the visible light range than neat organic patterns. Moreover, the nanosize of the photoresist building blocks makes them suitable for high resolution lithography. To have an in-depth understanding of the effect of physicochemical parameters on the size, shape and physical properties of photo-patterned structures, a detailed investigation was carried out on a zinc-oxo cluster photoresist combined with deep ultraviolet (DUV) lithography. The results show the impact of both DUV irradiation and thermal treatment on material patterning. The impact of crystallization is particularly discussed since it has a strong influence on the shape of patterns.
URI: http://dx.doi.org/10.1039/c6tc05201k
http://hdl.handle.net/11536/133136
ISSN: 2050-7526
DOI: 10.1039/c6tc05201k
期刊: JOURNAL OF MATERIALS CHEMISTRY C
Volume: 5
Issue: 10
起始頁: 2611
結束頁: 2619
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