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dc.contributor.authorTseng, Ming-Chunen_US
dc.contributor.authorWuu, Dong-Singen_US
dc.contributor.authorChen, Chi-Luen_US
dc.contributor.authorLee, Hsin-Yingen_US
dc.contributor.authorLin, Yu-Changen_US
dc.contributor.authorHorng, Ray-Huaen_US
dc.date.accessioned2019-04-03T06:42:28Z-
dc.date.available2019-04-03T06:42:28Z-
dc.date.issued2016-04-01en_US
dc.identifier.issn2159-3930en_US
dc.identifier.urihttp://dx.doi.org/10.1364/OME.6.001349en_US
dc.identifier.urihttp://hdl.handle.net/11536/133427-
dc.description.abstractTransparent conductive layers (TCLs) deposited on a GaP window layer were used to fabricate high-brightness p-side-up thin-film AlGaInP light-emitting diodes (LEDs) by the twice wafer-transfer technique. Indium tin oxide (ITO) and aluminum-doped zinc oxide (AZO) were used as TCLs for comparison. The TCLs improved droop of external quantum efficiencies (EQE) of LEDs and junction temperature, which result in increasing the light output power and thermal stability of the LEDs. The droop efficiency of Ref-LED, ITO-LED and AZO-LED were 64%, 27% and 15%, respectively. The junction temperature of ITO-LED and AZO-LED reduced to 49.3 and 39.6 degrees C at an injection current of 700 mA compared with that (80.8 degrees C) of Ref-LED. The LEDs with AZO layers exhibited the most excellent LED performance. The emission wavelength shifts of LEDs without a TCL, with an ITO layer, and with an AZO layer were 17, 8, and 3 nm, respectively, when the injection current was increased from 20 to 1000 mA. The above results are promising for the development of AZO thin films to replace ITO thin films for AlGaInP LED applications. (C) 2016 Optical Society of Americaen_US
dc.language.isoen_USen_US
dc.titlePerformance comparison of p-side-up thin-film AlGaInP light emitting diodes with aluminum-doped zinc oxide and indium tin oxide transparent conductive layersen_US
dc.typeArticleen_US
dc.identifier.doi10.1364/OME.6.001349en_US
dc.identifier.journalOPTICAL MATERIALS EXPRESSen_US
dc.citation.volume6en_US
dc.citation.issue4en_US
dc.citation.spage1349en_US
dc.citation.epage1357en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000373599200042en_US
dc.citation.woscount9en_US
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