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dc.contributor.authorHuang, HWen_US
dc.contributor.authorChu, JTen_US
dc.contributor.authorKao, CCen_US
dc.contributor.authorHseuh, THen_US
dc.contributor.authorLu, TCen_US
dc.contributor.authorKuo, HCen_US
dc.contributor.authorWang, SCen_US
dc.contributor.authorYu, CCen_US
dc.date.accessioned2014-12-08T15:18:32Z-
dc.date.available2014-12-08T15:18:32Z-
dc.date.issued2005-09-01en_US
dc.identifier.issn0957-4484en_US
dc.identifier.urihttp://dx.doi.org/10.1088/0957-4484/16/9/071en_US
dc.identifier.urihttp://hdl.handle.net/11536/13342-
dc.description.abstractThis investigation describes the development of an InGaN/GaN light emitting diode (LED) with a nano-roughened top p-GaN surface using an Ni nano-mask and laser etching. The light output of the InGaN/GaN LED with a nano-roughened top p-GaN surface is 1.55 times that of a conventional LED, and the wall-plug efficiency is 68% higher at 20 mA. The series resistance of the InGaN/GaN LED was reduced by 32% by the increase in the contact area of the nano-roughened surface.en_US
dc.language.isoen_USen_US
dc.titleEnhanced light output of an InGaN/GaN light emitting diode with a nano-roughened p-GaN surfaceen_US
dc.typeArticleen_US
dc.identifier.doi10.1088/0957-4484/16/9/071en_US
dc.identifier.journalNANOTECHNOLOGYen_US
dc.citation.volume16en_US
dc.citation.issue9en_US
dc.citation.spage1844en_US
dc.citation.epage1848en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000232089500071-
dc.citation.woscount66-
Appears in Collections:Articles


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