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dc.contributor.authorKuan, Chin-Ien_US
dc.contributor.authorLin, Horng-Chihen_US
dc.contributor.authorLi, Pei-Wenen_US
dc.contributor.authorHuang, Tiao-Yuanen_US
dc.date.accessioned2017-04-21T06:56:46Z-
dc.date.available2017-04-21T06:56:46Z-
dc.date.issued2016-03en_US
dc.identifier.issn0741-3106en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LED.2016.2518404en_US
dc.identifier.urihttp://hdl.handle.net/11536/133505-
dc.description.abstractIn this letter, we demonstrate 0.6-mu m ZnON thin-film transistors (TFTs) with the field-effect mobility of 71 cm(2)/V-sec, which to the best of our knowledge is the highest value ever reported on submicrometer oxide-semiconductor TFTs. The drive current, field-effect mobility, and subthreshold slope of ZnON TFTs are significantly improved as compared with their counterpart ZnO TFTs of the same channel dimensions and structure. Such an improvement in the field-effect mobility primarily results from a considerable reduction in the series source/drain (S/D) resistances because of suppression in an interfacial layer formation between Al S/D pads and the channel layer.en_US
dc.language.isoen_USen_US
dc.subjectZinc oxynitride (ZnON)en_US
dc.subjectoxide semiconductorsen_US
dc.subjectmobilityen_US
dc.subjectthin-film transistors (TFTs)en_US
dc.subjectsubmicronen_US
dc.titleHigh-Performance Submicrometer ZnON Thin-Film Transistors With Record Field-Effect Mobilityen_US
dc.identifier.doi10.1109/LED.2016.2518404en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.citation.volume37en_US
dc.citation.issue3en_US
dc.citation.spage303en_US
dc.citation.epage305en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000372372100017en_US
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