完整後設資料紀錄
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dc.contributor.authorLiao, Chen-Hongen_US
dc.contributor.authorHung, Pei-Sungen_US
dc.contributor.authorWu, Cheng-Yeouen_US
dc.contributor.authorChen, Hsin-Yien_US
dc.contributor.authorWu, Pu-Weien_US
dc.date.accessioned2017-04-21T06:56:36Z-
dc.date.available2017-04-21T06:56:36Z-
dc.date.issued2016-07en_US
dc.identifier.issn1388-2481en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.elecom.2016.04.009en_US
dc.identifier.urihttp://hdl.handle.net/11536/133885-
dc.description.abstractA combined electrochemical route involving electrophoresis and electrodeposition is developed to fabricate a large-area unsupported nickel inverse opaline film with thickness less than 10 pm. A vertical electrophoresis allows for the packing of 495 nm polystyrene microspheres on an ITO-coated glass to form a colloidal crystal with significantly reduced defects. Subsequently, a nickel electrodeposition is employed to fill the interstitial voids among the close-packed polystyrene microspheres, followed by the removal of the colloidal template in a two-stage process, leaving a robust nickel skeleton with hexagonally arranged pores and interconnected pore channels. This nickel skeleton is then detached from the ITO-coated glass via a liquid nitrogen treatment, rendering a free-standing nickel inverse opaline film in 2 x 2 cm(2). Porometer measurements indicate a narrow pore size distribution consistent with images from scanning electron microscope. We determine that the intensity ratio of (111)/(100) diffraction peak is an indicator for the strength of the Ni inverse opals, and thus affects its structural integrity upon detachment from the ITO-coated glass. (C) 2016 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectColloidal crystalsen_US
dc.subjectInverse opalsen_US
dc.subjectElectrophoresisen_US
dc.subjectElectrodepositionen_US
dc.subjectNickelen_US
dc.titleA combined electrochemical route to fabricate large-area and free-standing inverse opaline filmen_US
dc.identifier.doi10.1016/j.elecom.2016.04.009en_US
dc.identifier.journalELECTROCHEMISTRY COMMUNICATIONSen_US
dc.citation.volume68en_US
dc.citation.spage32en_US
dc.citation.epage35en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000379277300008en_US
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