標題: | Confirmation of filament dissolution behavior by analyzing electrical field effect during reset process in oxide-based RRAM |
作者: | Pan, Chih-Hung Chang, Ting-Chang Tsai, Tsung-Ming Chang, Kuan-Chang Chu, Tian-Jian Lin, Wen-Yan Chen, Min-Chen Sze, Simon M. 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
公開日期: | 26-九月-2016 |
摘要: | In this letter, we demonstrate completely different characteristics with different operating modes and analyze the electrical field effect to confirm the filament dissolution behavior. The device exhibited a larger memory window when using a single voltage sweep method during reset process rather than the traditional double sweep method. The phenomenon was verified by using fast I-V measurement to simulate the two operating methods. A better high resistance state (HRS) will be obtained with a very short rising time pulse, but quite notably, lower power consumption was needed. We proposed the electrical field effect to explain the phenomenon and demonstrate distribution by COMSOL simulation. Published by AIP Publishing. |
URI: | http://dx.doi.org/10.1063/1.4963672 http://hdl.handle.net/11536/134225 |
ISSN: | 0003-6951 |
DOI: | 10.1063/1.4963672 |
期刊: | APPLIED PHYSICS LETTERS |
Volume: | 109 |
Issue: | 13 |
顯示於類別: | 期刊論文 |