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dc.contributor.authorRen, Ting-Tingen_US
dc.contributor.authorWei, Mao-Qugnen_US
dc.contributor.authorHsiao, Chin-Chiangen_US
dc.contributor.authorChen, Bo-Yien_US
dc.contributor.authorLi, Mei-Yien_US
dc.contributor.authorLiou, Jui-Minen_US
dc.contributor.authorKo, Fu-Hsiangen_US
dc.contributor.authorLai, Yu-Shengen_US
dc.date.accessioned2017-04-21T06:50:13Z-
dc.date.available2017-04-21T06:50:13Z-
dc.date.issued2016en_US
dc.identifier.isbn978-4-9908753-1-2en_US
dc.identifier.urihttp://hdl.handle.net/11536/134349-
dc.description.abstractThis research describes the p-type nanostalactites (p-type NS) with high photothermal conversion capability has been demonstrated by rapid INC process without extra heat treatment. In optical property, p-type NS has ultralow reflectance below 5 % and high light absorption due to rough structures in the broadband wavelength (350 nm -1100 nm). It looks like a black body. Silicon, an indirect band material, can release thermal energy during the recombination process of photo-generated electron-hole pairs. P-type NS converts photon energy into heat rapidly and then photothermal effect occurs. Then, the temperature change of p-type NS is faster in 10 second than bulk p-type silicon. These nanostructures can not only enhance thermal conversion efficiency but be regarded as a great heat absorber.en_US
dc.language.isoen_USen_US
dc.titleHigh Photothermal Properties in Silicon Nanostructuresen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2016 23RD INTERNATIONAL WORKSHOP ON ACTIVE-MATRIX FLATPANEL DISPLAYS AND DEVICES (AM-FPD)en_US
dc.citation.spage219en_US
dc.citation.epage221en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000389600900072en_US
dc.citation.woscount0en_US
Appears in Collections:Conferences Paper