標題: | Nano-scale oxide layer prepared by plasma oxidation on single-crystalline aluminum film |
作者: | Chen, Peng-Yu Wu, Chu-Chun Fan, Yan-Ting Lin, Sheng-Di 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
公開日期: | 2016 |
摘要: | The plasma oxidation on single crystalline Al thin film grown by molecular beam epitaxy is presented. The dependence of oxidation rates on the N2O flux, the substrate temperature, the RF power, and the chamber pressure is studied with auger electron spectroscopy and transmission electron microscope. Our work provides a simple way to prepare a smooth nano-scale Al(2)O(3 f)ilm on aluminum, which is a key step to fabricate ultraviolet plasmonic nanolasers. |
URI: | http://hdl.handle.net/11536/134645 |
ISBN: | 978-1-5090-1493-4 |
期刊: | 2016 IEEE 16TH INTERNATIONAL CONFERENCE ON NANOTECHNOLOGY (IEEE-NANO) |
起始頁: | 809 |
結束頁: | 811 |
顯示於類別: | 會議論文 |