標題: Nano-scale oxide layer prepared by plasma oxidation on single-crystalline aluminum film
作者: Chen, Peng-Yu
Wu, Chu-Chun
Fan, Yan-Ting
Lin, Sheng-Di
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
公開日期: 2016
摘要: The plasma oxidation on single crystalline Al thin film grown by molecular beam epitaxy is presented. The dependence of oxidation rates on the N2O flux, the substrate temperature, the RF power, and the chamber pressure is studied with auger electron spectroscopy and transmission electron microscope. Our work provides a simple way to prepare a smooth nano-scale Al(2)O(3 f)ilm on aluminum, which is a key step to fabricate ultraviolet plasmonic nanolasers.
URI: http://hdl.handle.net/11536/134645
ISBN: 978-1-5090-1493-4
期刊: 2016 IEEE 16TH INTERNATIONAL CONFERENCE ON NANOTECHNOLOGY (IEEE-NANO)
起始頁: 809
結束頁: 811
顯示於類別:會議論文