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dc.contributor.authorChung, Steve S.en_US
dc.contributor.authorHsieh, E. R.en_US
dc.contributor.authorYang, S. P.en_US
dc.contributor.authorChuang, C. H.en_US
dc.date.accessioned2017-04-21T06:48:46Z-
dc.date.available2017-04-21T06:48:46Z-
dc.date.issued2016en_US
dc.identifier.isbn978-1-5090-0726-4en_US
dc.identifier.urihttp://hdl.handle.net/11536/134672-
dc.description.abstractFor the first time, we propose a one transistor nonvolatile memory which can solve the long time charge loss issue incurred in the conventional nitride-storage cell, a hurdle to the scaling of SONOS memory. The SONOS cell uses charge as the storage, while the new invention discloses a cell with one transistor and the gate connected to a simple MIM structure. The readout is from the transistor\'s Vth or I-d, similar to that of flash memory. A bilayer MIM is preferable for best performance. Results demonstrated that this memory exhibits excellent endurance, retention, large window, which can also solve the sneak path and forming issues in conventional crossbar ReRAM. The architecture is fully compatible with the logic CMOS technology and well-suited for both NOR and NAND memories, especially for future embedded applications.en_US
dc.language.isoen_USen_US
dc.titleA Novel One Transistor Non-volatile Memory Feasible for NOR and NAND Applications in IoT Eraen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2016 IEEE SILICON NANOELECTRONICS WORKSHOP (SNW)en_US
dc.citation.spage44en_US
dc.citation.epage45en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000391250500018en_US
dc.citation.woscount0en_US
Appears in Collections:Conferences Paper