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dc.contributor.authorHu, Yu-Chenen_US
dc.contributor.authorChen, Kuan-Nengen_US
dc.date.accessioned2017-04-21T06:48:46Z-
dc.date.available2017-04-21T06:48:46Z-
dc.date.issued2016en_US
dc.identifier.isbn978-1-5090-0726-4en_US
dc.identifier.urihttp://hdl.handle.net/11536/134682-
dc.description.abstractAn innovative bonding approach applied to flexible substrate bonding is proposed in this research. Thin-film metal pad is fabricated as bonding medium to provide vertical stacking. As compared to other bonding methods, such as anisotropic conductive film (ACF) or non-conductive paste (NCP), thin-film metal pad bonding approach provides the most attractive advantage of fine-pitch. The bonding condition at low temperature exhibits good electrical performance, proving its great potential in the applications of flexible substrate stacking.en_US
dc.language.isoen_USen_US
dc.titleDevelopment and Electrical Performance of Low Temperature Cu-Sn/In Bonding for 3D Flexible Substate Integrationen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2016 IEEE SILICON NANOELECTRONICS WORKSHOP (SNW)en_US
dc.citation.spage164en_US
dc.citation.epage165en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000391250500071en_US
dc.citation.woscount0en_US
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