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dc.contributor.authorYeh, TTen_US
dc.contributor.authorHsieh, TEen_US
dc.contributor.authorShieh, HPDen_US
dc.date.accessioned2014-12-08T15:18:45Z-
dc.date.available2014-12-08T15:18:45Z-
dc.date.issued2005-07-15en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.1957132en_US
dc.identifier.urihttp://hdl.handle.net/11536/13489-
dc.description.abstractThis work describes the effect of nitrogen doping to eutectic Sb-Te phase-change materials in order to enhance the speed of the amorphous-to-crystalline phase transformation. When nitrogen at a sputtering gas flow ratio of N-2/Ar=3% was doped in the eutectic Ge-In-Sb-Te recording layer, the data transfer rate was increased up to 1.6 times. When thin GeNx nucleation promotion layers were further added in below and above the recording layer, an overall enhancement up to 3.3 times in data transfer rate was achieved. The nitrogen contents corresponding to the N-2/Ar flow ratios (N-2/Ar=0%-10%) were calibrated by electron spectroscopy for chemical analysis. Transmission electron microscopy revealed that nitrogen doping was able to promote the phase transformation by generating numerous nucleation sites uniformly distributed in the recording layer and hence increased the recrystallization speed. (c) 2005 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleA method to enhance the data transfer rate of eutectic Sb-Te phase-change recording mediaen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.1957132en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume98en_US
dc.citation.issue2en_US
dc.citation.epageen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000230931500002-
dc.citation.woscount0-
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