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dc.contributor.authorWang, S. -L.en_US
dc.contributor.authorChen, C. -Y.en_US
dc.contributor.authorHsieh, M. -K.en_US
dc.contributor.authorLee, W. -C.en_US
dc.contributor.authorKung, A. H.en_US
dc.contributor.authorPeng, L. -H.en_US
dc.date.accessioned2017-04-21T06:49:15Z-
dc.date.available2017-04-21T06:49:15Z-
dc.date.issued2008en_US
dc.identifier.isbn978-1-4244-1546-5en_US
dc.identifier.urihttp://hdl.handle.net/11536/135066-
dc.description.abstractWe report a new type of phase-change materials based upon the compound of In-Ga-O. It is found to exhibit two-order of magnitude resistivity change between the high-resistive amorphous phase and the low-resistive cubic phase at a phase-change temperature similar to 250 degrees C. When the In-Ga-O is incorporated into a nonvolatile phase change memory (PCM) device with a double-heater (DH) structure, it exhibits an on/off resistance ratio of 1000 and cycling over 300 times which are superior to those observed on a single-heater (SH) PCM device. These results, together with a low bias point of 70 mu A at 6.5 volt and 1.5mA at 3.5 volt, respectively, for set/ reset operation of the DH-PCM device to the crystalline/amorphous state, suggest that In-Ga-O is a promising material candidate for low power application of PCM devices.en_US
dc.language.isoen_USen_US
dc.subjectnonvolatile memoryen_US
dc.subjectphase-change memory (PCM)en_US
dc.subjectindium gallium oxideen_US
dc.titleIn-Ga-O based double-heater phase change memory cellen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2008 JOINT NON-VOLATILE SEMICONDUCTOR MEMORY WORKSHOP AND INTERNATIONAL CONFERENCE ON MEMORY TECHNOLOGY AND DESIGN, PROCEEDINGSen_US
dc.citation.spage33en_US
dc.citation.epage+en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000256834300009en_US
dc.citation.woscount2en_US
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