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dc.contributor.authorChan, Chin-Wenen_US
dc.contributor.authorLin, Horng-Chihen_US
dc.contributor.authorHuang, Tiao-Yuanen_US
dc.date.accessioned2017-04-21T06:50:15Z-
dc.date.available2017-04-21T06:50:15Z-
dc.date.issued2014en_US
dc.identifier.isbn978-1-4799-5677-7en_US
dc.identifier.issn2161-4636en_US
dc.identifier.urihttp://hdl.handle.net/11536/135336-
dc.description.abstractN-channel InGaZnO (IGZO) inverters with a resistor-load were fabricated with film-profile engineering (FPE). In this scheme the profiles of the deposition films contained in the device are tailored to adjust its operation characteristics. The fabricated drive thin-film transistors (TFTs) show steep subthreshold swing (88 mV/dec) and high on/off current ratio (> 10(8)). Functional operation of the inverters is demonstrated with this simple scheme.en_US
dc.language.isoen_USen_US
dc.titleNovel BEOL InGaZnO R-load-Type Logic-Gate Technologyen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2014 IEEE SILICON NANOELECTRONICS WORKSHOP (SNW)en_US
dc.contributor.department電機學院zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentCollege of Electrical and Computer Engineeringen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000393376800072en_US
dc.citation.woscount0en_US
Appears in Collections:Conferences Paper