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dc.contributor.authorYu, Chang-Hungen_US
dc.contributor.authorSu, Pinen_US
dc.date.accessioned2017-04-21T06:50:14Z-
dc.date.available2017-04-21T06:50:14Z-
dc.date.issued2014en_US
dc.identifier.isbn978-1-4799-5677-7en_US
dc.identifier.issn2161-4636en_US
dc.identifier.urihttp://hdl.handle.net/11536/135339-
dc.description.abstractWe have reported anomalous electrostatic behaviors in drain-induced-barrier-lowering (DIBL), threshold voltage (VT) roll-off, subthreshold swing (SS), and intrinsic VT variability in GeOI p-MOSFET. The underlying mechanism responsible for these anomalous electrostatic characteristics is attributed to the valence-band offset between Ge channel and Si substrate due to their significant discrepancy in bandgap. This band offset results in an effective built-in forward body bias in GeOI pFET, and leads to different carrier profiles between GeOI pFET and nFET.en_US
dc.language.isoen_USen_US
dc.titleAnomalous Electrostatics and Intrinsic Variability in GeOI p-MOSFETen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2014 IEEE SILICON NANOELECTRONICS WORKSHOP (SNW)en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000393376800094en_US
dc.citation.woscount0en_US
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